The present document brings a discussion on the results of the previous chap.3, A0, chap.13, chap.23 and 24 of the 2025 book “Plasmas afterglows with N2 for Surface Treatments-edition 2024 » published by BPI (2025).
To distinguish the results of chapters in the book, it is presently chosen to name parts 1 – 6.
In part 1, it is reported that the kinetic reactions in the afterglows contain N2.
It is specifically considered the aN+N part of the N+N+M → N2(B,11) + M (M = N2, He or Ar) reaction at the origin of the N2, 580 nm band emission, which is the signature of the N atoms in the afterglow. It is studied the method to obtain aN+N from the I11/9 and I11/10 ratios in the afterglows of R(He, Ar) -N2-H2 gas mixtures.
It is recalled than in A1 of the 2025 book, the method to obtain the N-atom absolute density by NO titration is detailed and the intensity ratio method allows then to obtain the other active species density in the afterglow containing N2.
Part 2 is concerned by the diagnostics of N and H-atoms by Two Photon Laser Induced Fluorescence (TALIF) with complementary results of chap.13 of the 2025 book.
Part 3 gives additional results of Chap.3 in earlier works on the Ar and N2 microwave plasmas.
In Part 4, the active species densities in RF and HF afterglows reported in the chap.23 and 24 of the 2025 book are corrected with the new aN+N values presently obtained and compared with the previous results.
Then, in part 5, it is reworded by Yu-Kwon Kim, the results on TiO2 thin films nitriding in chap. 23 and 24 of the 2025 book.
Finally, in part 6, a general assessment is given on the most dense active species obtained in the flowing plasmas of rare gases and of gas mixtures containing N2, with several pieces of equipment and associated diagnostics.
Edited by
André RICARD
Laboratoire de Physique des Gaz et des Plasmas, Université Paris-Saclay, CNRS, 91.400 Orsay, France and Laplace, CNRS, Université Toulouse, 31077 Toulouse, France.
ISBN 978-81-999106-4-5 (Print)
ISBN 978-81-999106-8-3 (eBook)
DOI: https://doi.org/10.9734/bpi/mono/978-81-999106-4-5
The present document brings a discussion on the results of the previous chap.3, A0, chap.13, chap.23 and 24 of the 2025 book “Plasmas afterglows with N2 for Surface Treatments-edition 2024 » published by BPI (2025).
To distinguish the results of chapters in the book, it is presently chosen to name parts 1 – 6.
In part 1, it is reported that the kinetic reactions in the afterglows contain N2.
It is specifically considered the aN+N part of the N+N+M → N2(B,11) + M (M = N2, He or Ar) reaction at the origin of the N2, 580 nm band emission, which is the signature of the N atoms in the afterglow. It is studied the method to obtain aN+N from the I11/9 and I11/10 ratios in the afterglows of R(He, Ar) -N2-H2 gas mixtures.
It is recalled than in A1 of the 2025 book, the method to obtain the N-atom absolute density by NO titration is detailed and the intensity ratio method allows then to obtain the other active species density in the afterglow containing N2.
Part 2 is concerned by the diagnostics of N and H-atoms by Two Photon Laser Induced Fluorescence (TALIF) with complementary results of chap.13 of the 2025 book.
Part 3 gives additional results of Chap.3 in earlier works on the Ar and N2 microwave plasmas.
In Part 4, the active species densities in RF and HF afterglows reported in the chap.23 and 24 of the 2025 book are corrected with the new aN+N values presently obtained and compared with the previous results.
Then, in part 5, it is reworded by Yu-Kwon Kim, the results on TiO2 thin films nitriding in chap. 23 and 24 of the 2025 book.
Finally, in part 6, a general assessment is given on the most dense active species obtained in the flowing plasmas of rare gases and of gas mixtures containing N2, with several pieces of equipment and associated diagnostics.