https://stm2.bookpi.org/PAN2STAR/issue/feed 2026-02-18T09:28:58+00:00 Open Journal Systems <p>The present document brings a discussion on the results of the previous chap.3, A₀, chap.13, chap.23 and 24 of the 2025 book “<strong>Plasmas afterglows with N₂ for Surface Treatments-edition 2024 » </strong>published by BPI (2025)<strong>. </strong></p> <p><strong> </strong>To distinguish the results of chapters in the book, it is presently chosen to name parts 1 – 6.</p> <p>In part 1, it is reported that the kinetic reactions in the afterglows contain N₂.</p> <p>It is specifically considered the a_N+Npart of the N+N+M → N₂(B,11) + M (M = N₂, He or Ar) reaction at the origin of the N₂, 580 nm band emission, which is the signature of the N atoms in the afterglow. It is studied the method to obtain a_N+Nfrom the I_11/9 and I_11/10 ratios in the afterglows of R(He, Ar) -N₂-H₂ gas mixtures.</p> <p>It is recalled than in A₁ of the 2025 book, the method to obtain the N-atom absolute density by NO titration is detailed and the intensity ratio method allows then to obtain the other active species density in the afterglow containing N₂.</p> <p>Part 2 is concerned by the diagnostics of N and H-atoms by Two Photon Laser Induced Fluorescence (TALIF) with complementary results of chap.13 of the 2025 book.</p> <p>Part 3 gives additional results of Chap.3 in earlier works on the Ar and N₂ microwave plasmas.</p> <p>In Part 4, the active species densities in RF and HF afterglows reported in the chap.23 and 24 of the 2025 book are corrected with the new a_N+N values presently obtained and compared with the previous results.</p> <p>Then, in part 5, it is reworded by Yu-Kwon Kim, the results on TiO₂ thin films nitriding in chap. 23 and 24 of the 2025 book.</p> <p>Finally, in part 6, a general assessment is given on the most dense active species obtained in the flowing plasmas of rare gases and of gas mixtures containing N₂, with several pieces of equipment and associated diagnostics.</p> https://stm2.bookpi.org/PAN2STAR/article/view/971 2026-02-18T09:28:58+00:00 André RICARD

<p>The present book is especially focused on flowing plasmas and afterglow devices containing N₂<strong>. </strong>The plasmas were produced by high-frequency (RF, microwaves) discharges at low gas pressures. The microwave plasmas with surfatron and surfaguide cavities are specifically studied.</p> <p>The most relevant active species in the studied flowing plasmas are the atoms and radicals coming from dissociated molecules ( N₂, H₂, O₂, CH₄). There is an interest in rare gas–molecule mixtures to obtain plasmas with high-energy electrons in He and long plasmas residence times in Ar.</p> <p>The N and O atom densities are obtained after NO titration and related to N₂ emission spectroscopy by discussing two methods to determine the part of N+N recombination at the origin of the observed N₂ radiative states. The other active species densities are obtained by the line ratio intensity method.</p> <p>To obtain quantitative measurements of the active species densities, it has been compared the results of NO titration for N and O – atoms to laser induced fluorescence (LIF, TALIF) for N, O and H-atoms. These last sophisticated laser method has allowed to choose the appropriate kinetic reactions in the N₂-H₂and N₂-CH₄ flowing afterglows.</p> <p>The N, H, O and C-atoms, NH and CN radicals were studied for plasma chemistry and surface treatments. The nitriding of TiO₂ thin films has been analysed in detail.</p>

2026-02-18T00:00:00+00:00 Copyright (c) 2026 Author(s). The licensee is the publisher (BP International).